Semiconductor package and method

ABSTRACT

In an embodiment, a device includes: an integrated circuit die; a first dielectric layer over the integrated circuit die; a first metallization pattern extending through the first dielectric layer to electrically connect to the integrated circuit die; a second dielectric layer over the first metallization pattern; an under bump metallurgy extending through the second dielectric layer; a third dielectric layer over the second dielectric layer and portions of the under bump metallurgy; a conductive ring sealing an interface of the third dielectric layer and the under bump metallurgy; and a conductive connector extending through the center of the conductive ring, the conductive connector electrically connected to the under bump metallurgy.

PRIORITY CLAIM AND CROSS-REFERENCE

This application is a continuation of U.S. patent application Ser. No.16/588,345, filed on Sep. 30, 2019, entitled “Semiconductor Package andMethod,” which is a division of U.S. patent application Ser. No.15/907,474, filed on Feb. 28, 2018, entitled “Semiconductor Package andMethod,” now U.S. Pat. No. 10,529,650 issued on Jan. 7, 2020, whichclaims the benefit of U.S. Provisional Application No. 62/586,431, filedon Nov. 15, 2017, which applications are hereby incorporated herein byreference in their entirety.

BACKGROUND

The semiconductor industry has experienced rapid growth due to ongoingimprovements in the integration density of a variety of electroniccomponents (e.g., transistors, diodes, resistors, capacitors, etc.). Forthe most part, improvement in integration density has resulted fromiterative reduction of minimum feature size, which allows morecomponents to be integrated into a given area. As the demand forshrinking electronic devices has grown, a need for smaller and morecreative packaging techniques of semiconductor dies has emerged. Anexample of such packaging systems is Package-on-Package (PoP)technology. In a PoP device, a top semiconductor package is stacked ontop of a bottom semiconductor package to provide a high level ofintegration and component density. PoP technology generally enablesproduction of semiconductor devices with enhanced functionalities andsmall footprints on a printed circuit board (PCB).

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the present disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the dimensions of thevarious features may be arbitrarily increased or reduced for clarity ofdiscussion.

FIGS. 1 through 19 illustrate cross-sectional views of intermediatesteps during a process for forming device packages, in accordance withsome embodiments.

FIGS. 20 through 21 illustrate cross-sectional views of intermediatesteps during a process for forming a package structure, in accordancewith some embodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the invention. Specificexamples of components and arrangements are described below to simplifythe present disclosure. These are, of course, merely examples and arenot intended to be limiting. For example, the formation of a firstfeature over or on a second feature in the description that follows mayinclude embodiments in which the first and second features are formed indirect contact, and may also include embodiments in which additionalfeatures may be formed between the first and second features, such thatthe first and second features may not be in direct contact. In addition,the present disclosure may repeat reference numerals and/or letters inthe various examples. This repetition is for the purpose of simplicityand clarity and does not in itself dictate a relationship between thevarious embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath,” “below,” “lower,”“above,” “upper” and the like, may be used herein for ease ofdescription to describe one element or feature's relationship to anotherelement(s) or feature(s) as illustrated in the figures. The spatiallyrelative terms are intended to encompass different orientations of thedevice in use or operation in addition to the orientation depicted inthe figures. The apparatus may be otherwise oriented (rotated 90 degreesor at other orientations) and the spatially relative descriptors usedherein may likewise be interpreted accordingly.

In accordance with some embodiments, a dielectric layer is formed on anunder bump metallurgy (UBM) of a redistribution structure. Openings areformed in the dielectric layer, exposing the UBM. A conductive paste isformed at an interface of the dielectric layer and the UBM, and thencured. Flux is formed on the UBM, and a conductive connector (e.g.,solder) is formed on the flux. During reflow of the conductiveconnector, the conductive paste prevents the flux from entering theinterface of the dielectric layer and the UBM. Adhesion between thedielectric layer and UBM may thus be improved, thereby improving themechanical reliability of the redistribution structure.

FIGS. 1 through 19 illustrate cross-sectional views of intermediatesteps during a process for forming first packages 200, in accordancewith some embodiments. A first package region 600 and a second packageregion 602 are illustrated, and a first package 200 is formed in eachpackage region. The first packages 200 may also be referred to asintegrated fan-out (InFO) packages.

In FIG. 1 , a carrier substrate 100 is provided, and a release layer 102is formed on the carrier substrate 100. The carrier substrate 100 may bea glass carrier substrate, a ceramic carrier substrate, or the like. Thecarrier substrate 100 may be a wafer, such that multiple packages can beformed on the carrier substrate 100 simultaneously. The release layer102 may be formed of a polymer-based material, which may be removedalong with the carrier substrate 100 from the overlying structures thatwill be formed in subsequent steps. In some embodiments, the releaselayer 102 is an epoxy-based thermal-release material, which loses itsadhesive property when heated, such as a light-to-heat-conversion (LTHC)release coating. In other embodiments, the release layer 102 may be anultra-violet (UV) glue, which loses its adhesive property when exposedto UV lights. The release layer 102 may be dispensed as a liquid andcured, may be a laminate film laminated onto the carrier substrate 100,or may be the like. The top surface of the release layer 102 may beleveled and may have a high degree of coplanarity.

In FIG. 2 , a dielectric layer 104, a metallization pattern 106(sometimes referred to as redistribution layers or redistributionlines), and a dielectric layer 108 are formed. The dielectric layer 104is formed on the release layer 102. The bottom surface of the dielectriclayer 104 may be in contact with the top surface of the release layer102. In some embodiments, the dielectric layer 104 is formed of apolymer, such as polybenzoxazole (PBO), polyimide, benzocyclobutene(BCB), or the like. In other embodiments, the dielectric layer 104 isformed of a nitride such as silicon nitride; an oxide such as siliconoxide, phosphosilicate glass (PSG), borosilicate glass (BSG),boron-doped phosphosilicate glass (BPSG), or the like; or the like. Thedielectric layer 104 may be formed by any acceptable deposition process,such as spin coating, chemical vapor deposition (CVD), laminating, thelike, or a combination thereof.

The metallization pattern 106 is formed on the dielectric layer 104. Asan example to form metallization pattern 106, a seed layer (not shown)is formed over the dielectric layer 104. In some embodiments, the seedlayer is a metal layer, which may be a single layer or a composite layercomprising a plurality of sub-layers formed of different materials. Insome embodiments, the seed layer comprises a titanium layer and a copperlayer over the titanium layer. The seed layer may be formed using, forexample, PVD or the like. A photo resist is then formed and patterned onthe seed layer. The photo resist may be formed by spin coating or thelike and may be exposed to light for patterning. The pattern of thephoto resist corresponds to the metallization pattern 106. Thepatterning forms openings through the photo resist to expose the seedlayer. A conductive material is formed in the openings of the photoresist and on the exposed portions of the seed layer. The conductivematerial may be formed by plating, such as electroplating or electrolessplating, or the like. The conductive material may comprise a metal, likecopper, titanium, tungsten, aluminum, or the like. Then, the photoresist and portions of the seed layer on which the conductive materialis not formed are removed. The photo resist may be removed by anacceptable ashing or stripping process, such as using an oxygen plasmaor the like. Once the photo resist is removed, exposed portions of theseed layer are removed, such as by using an acceptable etching process,such as by wet or dry etching. The remaining portions of the seed layerand conductive material form the metallization pattern 106.

The dielectric layer 108 is formed on the metallization pattern 106 andthe dielectric layer 104. In some embodiments, the dielectric layer 108is formed of a polymer, which may be a photo-sensitive material such asPBO, polyimide, BCB, or the like, that may be patterned using alithography mask. In other embodiments, the dielectric layer 108 isformed of a nitride such as silicon nitride; an oxide such as siliconoxide, PSG, BSG, BPSG; or the like. The dielectric layer 108 may beformed by spin coating, lamination, CVD, the like, or a combinationthereof. The dielectric layer 108 is then patterned to form openings toexpose portions of the metallization pattern 106. The patterning may beby an acceptable process, such as by exposing the dielectric layer 108to light when the dielectric layer 108 is a photo-sensitive material orby etching using, for example, an anisotropic etch.

The dielectric layers 104 and 108 and the metallization pattern 106 maybe referred to as a back-side redistribution structure 110. In theembodiment shown, the back-side redistribution structure 110 includesthe two dielectric layers 104 and 108 and one metallization pattern 106.In other embodiments, the back-side redistribution structure 110 caninclude any number of dielectric layers, metallization patterns, andconductive vias. One or more additional metallization pattern anddielectric layer may be formed in the back-side redistribution structure110 by repeating the processes for forming the metallization pattern 106and dielectric layer 108. Conductive vias (not shown) may be formedduring the formation of a metallization pattern by forming the seedlayer and conductive material of the metallization pattern in theopening of the underlying dielectric layer. The conductive vias maytherefore interconnect and electrically couple the various metallizationpatterns.

In FIG. 3 , through vias 112 are formed. As an example to form thethrough vias 112, a seed layer is formed over the back-sideredistribution structure 110, e.g., the dielectric layer 108 and theexposed portions of the metallization pattern 106 as illustrated. Insome embodiments, the seed layer is a metal layer, which may be a singlelayer or a composite layer comprising a plurality of sub-layers formedof different materials. In some embodiments, the seed layer comprises atitanium layer and a copper layer over the titanium layer. The seedlayer may be formed using, for example, PVD or the like. A photo resistis formed and patterned on the seed layer. The photo resist may beformed by spin coating or the like and may be exposed to light forpatterning. The pattern of the photo resist corresponds to through vias.The patterning forms openings through the photo resist to expose theseed layer. A conductive material is formed in the openings of the photoresist and on the exposed portions of the seed layer. The conductivematerial may be formed by plating, such as electroplating or electrolessplating, or the like. The conductive material may comprise a metal, likecopper, titanium, tungsten, aluminum, or the like. The photo resist andportions of the seed layer on which the conductive material is notformed are removed. The photo resist may be removed by an acceptableashing or stripping process, such as using an oxygen plasma or the like.Once the photo resist is removed, exposed portions of the seed layer areremoved, such as by using an acceptable etching process, such as by wetor dry etching. The remaining portions of the seed layer and conductivematerial form the through vias 112.

In FIG. 4 , integrated circuit dies 114 are adhered to the dielectriclayer 108 by an adhesive 116. Although two integrated circuit dies 114are illustrated as being adhered in each of the first package region 600and the second package region 602, it should be appreciated that more orless integrated circuit dies 114 may be adhered in each package region.For example, only one integrated circuit die 114 may be adhered in eachregion. The integrated circuit dies 114 may be logic dies (e.g., centralprocessing unit, microcontroller, etc.), memory dies (e.g., dynamicrandom access memory (DRAM) die, static random access memory (SRAM) die,etc.), power management dies (e.g., power management integrated circuit(PMIC) die), radio frequency (RF) dies, sensor dies,micro-electro-mechanical-system (MEMS) dies, signal processing dies(e.g., digital signal processing (DSP) die), front-end dies (e.g.,analog front-end (AFE) dies), the like, or a combination thereof. Also,in some embodiments, the integrated circuit dies 114 may be differentsizes (e.g., different heights and/or surface areas), and in otherembodiments, the integrated circuit dies 114 may be the same size (e.g.,same heights and/or surface areas).

Before being adhered to the dielectric layer 108, the integrated circuitdies 114 may be processed according to applicable manufacturingprocesses to form integrated circuits in the integrated circuit dies114. For example, the integrated circuit dies 114 each include asemiconductor substrate 118, such as silicon, doped or undoped, or anactive layer of a semiconductor-on-insulator (SOI) substrate. Thesemiconductor substrate may include other semiconductor materials, suchas germanium; a compound semiconductor including silicon carbide,gallium arsenic, gallium phosphide, indium phosphide, indium arsenide,and/or indium antimonide; an alloy semiconductor including SiGe, GaAsP,AlInAs, AlGaAs, GaInAs, GaInP, and/or GaInAsP; or combinations thereof.Other substrates, such as multi-layered or gradient substrates, may alsobe used. Devices, such as transistors, diodes, capacitors, resistors,etc., may be formed in and/or on the semiconductor substrate 118 and maybe interconnected by interconnect structures 120 formed by, for example,metallization patterns in one or more dielectric layers on thesemiconductor substrate 118 to form an integrated circuit.

The integrated circuit dies 114 further comprise pads 122, such asaluminum pads, to which external connections are made. The pads 122 areon what may be referred to as respective active sides of the integratedcircuit dies 114. Passivation films 124 are on the integrated circuitdies 114 and on portions of the pads 122. Openings are through thepassivation films 124 to the pads 122. Die connectors 126, such asconductive pillars (for example, comprising a metal such as copper), arein the openings through the passivation films 124 and are mechanicallyand electrically coupled to the respective pads 122. The die connectors126 may be formed by, for example, plating, or the like. The dieconnectors 126 electrically couple the respective integrated circuits ofthe integrated circuit dies 114.

A dielectric material 128 is on the active sides of the integratedcircuit dies 114, such as on the passivation films 124 and the dieconnectors 126. The dielectric material 128 laterally encapsulates thedie connectors 126, and the dielectric material 128 is laterallycoterminous with the respective integrated circuit dies 114. Thedielectric material 128 may be a polymer such as PBO, polyimide, BCB, orthe like; a nitride such as silicon nitride or the like; an oxide suchas silicon oxide, PSG, BSG, BPSG, or the like; the like, or acombination thereof, and may be formed, for example, by spin coating,lamination, CVD, or the like.

The adhesive 116 is on back-sides of the integrated circuit dies 114 andadheres the integrated circuit dies 114 to the back-side redistributionstructure 110, such as the dielectric layer 108. The adhesive 116 may beany suitable adhesive, epoxy, die attach film (DAF), or the like. Theadhesive 116 may be applied to a back-side of the integrated circuitdies 114, such as to a back-side of the respective semiconductor waferor may be applied over the surface of the carrier substrate 100. Theintegrated circuit dies 114 may be singulated, such as by sawing ordicing, and adhered to the dielectric layer 108 by the adhesive 116using, for example, a pick-and-place tool.

In FIG. 5 , an encapsulant 130 is formed on the various components. Theencapsulant 130 may be a molding compound, epoxy, or the like, and maybe applied by compression molding, transfer molding, or the like. Theencapsulant 130 may be formed over the carrier substrate 100 such thatthe through vias 112 and/or the die connectors 126 of the integratedcircuit dies 114 are buried or covered. The encapsulant 130 is thencured.

In FIG. 6 , a planarization process is performed on the encapsulant 130to expose the through vias 112 and the die connectors 126. Theplanarization process may also grind the dielectric material 128. Topsurfaces of the through vias 112, die connectors 126, dielectricmaterial 128, and encapsulant 130 are coplanar after the planarizationprocess. The planarization process may be, for example, achemical-mechanical polish (CMP), a grinding process, or the like. Insome embodiments, the planarization may be omitted, for example, if thethrough vias 112 and die connectors 126 are already exposed.

In FIGS. 7 through 15 , a front-side redistribution structure 132 isformed. As will be illustrated, the front-side redistribution structure132 includes dielectric layers 134, 140, 146, 152, and 158, and alsoincludes metallization patterns 138, 144, and 150. The metallizationpatterns may also be referred to as redistribution layers orredistribution lines, and include conductive vias and conductive lines(not separately labeled).

In FIG. 7 , the dielectric layer 134 is deposited on the encapsulant130, through vias 112, and die connectors 126. In some embodiments, thedielectric layer 134 is formed of a polymer, which may be aphoto-sensitive material such as PBO, polyimide, BCB, or the like, thatmay be patterned using a lithography mask. In other embodiments, thedielectric layer 134 is formed of a nitride such as silicon nitride; anoxide such as silicon oxide, PSG, BSG, BPSG; or the like. The dielectriclayer 134 may be formed by spin coating, lamination, CVD, the like, or acombination thereof.

The dielectric layer 134 is then patterned. The patterning formsopenings 136 to expose portions of the through vias 112 and the dieconnectors 126. The patterning may be by an acceptable process, such asby exposing the dielectric layer 134 to light when the dielectric layer134 is a photo-sensitive material or by etching using, for example, ananisotropic etch. If the dielectric layer 134 is a photo-sensitivematerial, the dielectric layer 134 can be developed after the exposure.

In FIG. 8 , the metallization pattern 138 with vias is formed on thedielectric layer 134. As an example to form the metallization pattern138, a seed layer (not shown) is formed over the dielectric layer 134and in the openings 136 through the dielectric layer 134. In someembodiments, the seed layer is a metal layer, which may be a singlelayer or a composite layer comprising a plurality of sub-layers formedof different materials. In some embodiments, the seed layer comprises atitanium layer and a copper layer over the titanium layer. The seedlayer may be formed using, for example, PVD or the like. A photo resistis then formed and patterned on the seed layer. The photo resist may beformed by spin coating or the like and may be exposed to light forpatterning. The pattern of the photo resist corresponds to themetallization pattern 138. The patterning forms openings through thephoto resist to expose the seed layer. A conductive material is formedin the openings of the photo resist and on the exposed portions of theseed layer. The conductive material may be formed by plating, such aselectroplating or electroless plating, or the like. The conductivematerial may comprise a metal, like copper, titanium, tungsten,aluminum, or the like. Then, the photo resist and portions of the seedlayer on which the conductive material is not formed are removed. Thephoto resist may be removed by an acceptable ashing or strippingprocess, such as using an oxygen plasma or the like. Once the photoresist is removed, exposed portions of the seed layer are removed, suchas by using an acceptable etching process, such as by wet or dryetching. The remaining portions of the seed layer and conductivematerial form the metallization pattern 138 and vias. The vias areformed in openings 136 through the dielectric layer 134 to, e.g., thethrough vias 112 and/or the die connectors 126.

In FIG. 9 , the dielectric layer 140 is deposited on the metallizationpattern 138 and the dielectric layer 134. In some embodiments, thedielectric layer 140 is formed of a polymer, which may be aphoto-sensitive material such as PBO, polyimide, BCB, or the like, thatmay be patterned using a lithography mask. In other embodiments, thedielectric layer 140 is formed of a nitride such as silicon nitride; anoxide such as silicon oxide, PSG, BSG, BPSG; or the like. The dielectriclayer 140 may be formed by spin coating, lamination, CVD, the like, or acombination thereof.

The dielectric layer 140 is then patterned. The patterning formsopenings 142 to expose portions of the metallization pattern 138. Thepatterning may be by an acceptable process, such as by exposing thedielectric layer 140 to light when the dielectric layer 140 is aphoto-sensitive material or by etching using, for example, ananisotropic etch. If the dielectric layer 140 is a photo-sensitivematerial, the dielectric layer 140 can be developed after the exposure.

In FIG. 10 , the metallization pattern 144 with vias is formed on thedielectric layer 140. As an example to form the metallization pattern144, a seed layer (not shown) is formed over the dielectric layer 140and in the openings 142 through the dielectric layer 140. In someembodiments, the seed layer is a metal layer, which may be a singlelayer or a composite layer comprising a plurality of sub-layers formedof different materials. In some embodiments, the seed layer comprises atitanium layer and a copper layer over the titanium layer. The seedlayer may be formed using, for example, PVD or the like. A photo resistis then formed and patterned on the seed layer. The photo resist may beformed by spin coating or the like and may be exposed to light forpatterning. The pattern of the photo resist corresponds to themetallization pattern 144. The patterning forms openings through thephoto resist to expose the seed layer. A conductive material is formedin the openings of the photo resist and on the exposed portions of theseed layer. The conductive material may be formed by plating, such aselectroplating or electroless plating, or the like. The conductivematerial may comprise a metal, like copper, titanium, tungsten,aluminum, or the like. Then, the photo resist and portions of the seedlayer on which the conductive material is not formed are removed. Thephoto resist may be removed by an acceptable ashing or strippingprocess, such as using an oxygen plasma or the like. Once the photoresist is removed, exposed portions of the seed layer are removed, suchas by using an acceptable etching process, such as by wet or dryetching. The remaining portions of the seed layer and conductivematerial form the metallization pattern 144 and vias. The vias areformed in the openings 142 through the dielectric layer 140 to, e.g.,portions of the metallization pattern 138.

In FIG. 11 , the dielectric layer 146 is deposited on the metallizationpattern 144 and the dielectric layer 140. In some embodiments, thedielectric layer 146 is formed of a polymer, which may be aphoto-sensitive material such as PBO, polyimide, BCB, or the like, thatmay be patterned using a lithography mask. In other embodiments, thedielectric layer 146 is formed of a nitride such as silicon nitride; anoxide such as silicon oxide, PSG, BSG, BPSG; or the like. The dielectriclayer 146 may be formed by spin coating, lamination, CVD, the like, or acombination thereof.

The dielectric layer 146 is then patterned. The patterning formsopenings 148 to expose portions of the metallization pattern 144. Thepatterning may be by an acceptable process, such as by exposing thedielectric layer 146 to light when the dielectric layer 146 is aphoto-sensitive material or by etching using, for example, ananisotropic etch. If the dielectric layer 146 is a photo-sensitivematerial, the dielectric layer 146 can be developed after the exposure.

In FIG. 12 , the metallization pattern 150 with vias is formed on thedielectric layer 146. As an example to form metallization pattern 150, aseed layer (not shown) is formed over the dielectric layer 146 and inthe openings 148 through the dielectric layer 146. In some embodiments,the seed layer is a metal layer, which may be a single layer or acomposite layer comprising a plurality of sub-layers formed of differentmaterials. In some embodiments, the seed layer comprises a titaniumlayer and a copper layer over the titanium layer. The seed layer may beformed using, for example, PVD or the like. A photo resist is thenformed and patterned on the seed layer. The photo resist may be formedby spin coating or the like and may be exposed to light for patterning.The pattern of the photo resist corresponds to the metallization pattern150. The patterning forms openings through the photo resist to exposethe seed layer. A conductive material is formed in the openings of thephoto resist and on the exposed portions of the seed layer. Theconductive material may be formed by plating, such as electroplating orelectroless plating, or the like. The conductive material may comprise ametal, like copper, titanium, tungsten, aluminum, or the like. Then, thephoto resist and portions of the seed layer on which the conductivematerial is not formed are removed. The photo resist may be removed byan acceptable ashing or stripping process, such as using an oxygenplasma or the like. Once the photo resist is removed, exposed portionsof the seed layer are removed, such as by using an acceptable etchingprocess, such as by wet or dry etching. The remaining portions of theseed layer and conductive material form the metallization pattern 150and vias. The vias are formed in openings through the dielectric layer146 to, e.g., portions of the metallization pattern 144.

In FIG. 13 , the dielectric layer 152 is deposited on the metallizationpattern 150 and the dielectric layer 146. In some embodiments, thedielectric layer 152 is formed of a polymer, which may be aphoto-sensitive material such as PBO, polyimide, BCB, or the like, thatmay be patterned using a lithography mask. In other embodiments, thedielectric layer 152 is formed of a nitride such as silicon nitride; anoxide such as silicon oxide, PSG, BSG, BPSG; or the like. The dielectriclayer 152 may be formed by spin coating, lamination, CVD, the like, or acombination thereof.

The dielectric layer 152 is then patterned. The patterning formsopenings 154 to expose portions of the metallization pattern 150. Thepatterning may be by an acceptable process, such as by exposing thedielectric layer 152 to light when the dielectric layer 152 is aphoto-sensitive material or by etching using, for example, ananisotropic etch. If the dielectric layer 152 is a photo-sensitivematerial, the dielectric layer 152 can be developed after the exposure.The openings 154 may be wider than the openings 136, 142, 148.

In FIG. 14 , UBMs 156 are formed on the dielectric layer 152. In theillustrated embodiment, the UBMs 156 are formed through the openings 154through the dielectric layer 152 to the metallization pattern 150. As anexample to form the UBMs 156, a seed layer (not shown) is formed overthe dielectric layer 152. In some embodiments, the seed layer is a metallayer, which may be a single layer or a composite layer comprising aplurality of sub-layers formed of different materials. In someembodiments, the seed layer comprises a titanium layer and a copperlayer over the titanium layer. The seed layer may be formed using, forexample, PVD or the like. A photo resist is then formed and patterned onthe seed layer. The photo resist may be formed by spin coating or thelike and may be exposed to light for patterning. The pattern of thephoto resist corresponds to the UBMs 156. The patterning forms openingsthrough the photo resist to expose the seed layer. A conductive materialis formed in the openings of the photo resist and on the exposedportions of the seed layer. The conductive material may be formed byplating, such as electroplating or electroless plating, or the like. Theconductive material may comprise a metal such as silver, gold, aluminum,palladium, nickel, nickel alloys, tungsten alloys, chromium, chromiumalloys, the like, or combinations thereof, and may be multilayerconductive features. In an embodiment, the UBMs 156 include a nickellayer, a gold layer, and a palladium layer, and are formed by anelectroless nickel-electroless palladium-immersion gold technique(ENEPIG) process. Once the conductive material is formed, the photoresist and portions of the seed layer on which the conductive materialis not formed are removed. The photo resist may be removed by anacceptable ashing or stripping process, such as using an oxygen plasmaor the like. Once the photo resist is removed, exposed portions of theseed layer are removed, such as by using an acceptable etching process,such as by wet or dry etching. The remaining portions of the seed layerand conductive material form the UBMs 156. In embodiments where the UBMs156 are formed differently, more photo resist and patterning steps maybe utilized.

In FIG. 15 , the dielectric layer 158 is deposited on the UBMs 156 andthe dielectric layer 146. In some embodiments, the dielectric layer 158is formed of a polymer, which may be a photo-sensitive material such asPBO, polyimide, BCB, or the like, that may be patterned using alithography mask. In other embodiments, the dielectric layer 158 isformed of a nitride such as silicon nitride; an oxide such as siliconoxide, PSG, BSG, BPSG; or the like. The dielectric layer 158 may beformed by spin coating, lamination, CVD, the like, or a combinationthereof.

The dielectric layer 158 is then patterned. The patterning formsopenings 160 to expose portions of the UBMs 156. The patterning may beby an acceptable process, such as by exposing the dielectric layer 158to light when the dielectric layer 158 is a photo-sensitive material orby etching using, for example, an anisotropic etch. If the dielectriclayer 158 is a photo-sensitive material, the dielectric layer 158 can bedeveloped after the exposure.

The front-side redistribution structure 132 is shown as an example. Moreor fewer dielectric layers and metallization patterns may be formed inthe front-side redistribution structure 132. If fewer dielectric layersand metallization patterns are to be formed, steps and processesdiscussed above may be omitted. If more dielectric layers andmetallization patterns are to be formed, steps and processes discussedabove may be repeated. One having ordinary skill in the art will readilyunderstand which steps and processes would be omitted or repeated.

In FIG. 16 , a conductive ring 164 is formed on the UBMs 156, around theperimeter of the openings 160. Further, conductive connectors 168 areformed on the UBMs 156, in the openings 160. FIGS. 17A through 17C arecross-sectional views illustrating more details of a region 650 during aprocess for forming the conductive ring 164 and conductive connectors168, and FIG. 18 is a top-down view illustrating more details of theregion 650 after formation of the conductive ring 164. FIGS. 16, 17A,17B, 17C, and 18 are described in conjunction with one another.

In FIG. 17A, a conductive paste 162 is formed on the UBMs 156. Theconductive paste 162 may be, e.g., a copper paste, a solder paste, asilver paste, or the like, and may be dispensed by, e.g., a printingprocess or the like. In embodiments where a printing process is used, animage with the desired pattern of the conductive paste 162 is printed onthe UBMs 156 using a stencil. The conductive paste 162 is formed as anannulus or ring around the perimeter of the openings 160, sealing theinterface of the UBMs 156 and dielectric layer 158. The conductive paste162 extends along a top surface of the dielectric layer 158, sides ofthe dielectric layer 158 defining the openings 160, and portions of theUBMs 156.

After formation, the conductive paste 162 is cured to harden it, therebyforming the conductive ring 164. The conductive ring 164 may be cured byan annealing process performed at a temperate of from about 100° C. toabout 200° C., such as about 150° C., and for a time of from about 30minutes to about 2 hours.

The UBMs 156 are formed having a radius R₁ of from about 100 μm to about250 μm. The openings 160 are formed having a radius R₂ of from about 70μm to about 220 μm. The radius R₁ of the UBMs 156 is greater than theradius R₂ of the openings 160. The conductive ring 164 has an annularshape, with an outer radius R₃ of from about 100 μm to about 250 μm andan inner radius R₄ of from about 50 μm to about 200 μm. The differentradii are related according to: R₁>R₃>R₂>R₄.

The conductive ring 164 is formed to a width W₁. The width W₁ is thedifference between the outer radius R₃ and inner radius R₄ of theconductive ring 164. In embodiments where the conductive ring 164 iscopper paste formed by printing, the width W₁ is from about 30 μm toabout 50 μm. Printing techniques for copper paste may have up to 30 μmof inaccuracy. As such, a width W₁ of at least 30 μm may ensure theinterfaces of the dielectric layer 158 and UBMs 156 are completelysealed by the conductive ring 164, notwithstanding printing errors orshifts. Further, increasing the exposed surface area of the UBMs 156allows the material of the conductive connectors 168 to more easilyspread during reflow. As such, a width W₁ of up to 50 μm may ensure thatsufficient surface area of the UBMs 156 is exposed.

In FIG. 17B, the UBMs 156 are coated with a flux 166. The flux 166 maybe, e.g., a no-clean flux. The flux 166 may be applied to the surfacesof the UBMs 156 by, e.g., a jetting process, and may be formed to athickness of from about 25 μm to about 50 μm. The conductive ring 164acts as a barrier, preventing the flux 166 from reacting at theinterfaces of the UBMs 156 and dielectric layer 158. The flux 166 isformed within the boundaries of the inner radius of the conductive ring164.

In FIG. 17C, the conductive connectors 168 are formed in the openings160 and on the UBMs 156 (e.g., flux 166). Each conductive connector 168extends completely through the middle of a conductive ring 164. Theconductive connectors 168 may be BGA connectors, solder balls, metalpillars, controlled collapse chip connection (C4) bumps, micro bumps,ENEPIG-formed bumps, or the like. The conductive connectors 168 mayinclude a conductive material such as solder, copper, aluminum, gold,nickel, silver, palladium, tin, the like, or a combination thereof. Insome embodiments, the conductive connectors 168 are formed by initiallyforming a layer of solder through such commonly used methods such asevaporation, electroplating, printing, solder transfer, ball placement,or the like. Once a layer of solder has been formed on the structure, areflow may be performed in order to shape the material into the desiredbump shapes. In another embodiment, the conductive connectors 168 aremetal pillars (such as a copper pillar) formed by a sputtering,printing, electro plating, electroless plating, CVD, or the like. Themetal pillars may be solder free and have substantially verticalsidewalls. In some embodiments, a metal cap layer (not shown) is formedon the top of the metal pillars. The metal cap layer may include nickel,tin, tin-lead, gold, silver, palladium, indium, nickel-palladium-gold,nickel-gold, the like, or a combination thereof and may be formed by aplating process. After formation, the conductive connectors 168 have aradius R₅. In an embodiment, the radius R₅ of the conductive connectors168 is greater than the inner radius R₄ of the conductive ring 164.

During reflow, the flux 166 may be consumed, and the conductiveconnectors 168 wet to the conductive ring 164 and UBMs 156. Further, thematerials of the conductive ring 164 and UBMs 156 form an intermetalliccompound (IMC) 170 during reflow. The IMC 170 may conform to the shapeof the underlying UBMs 156. The materials of the conductive connectors168 and conductive ring 164 also form an IMC 172 during reflow. The IMC172 may conform to the shape of the underlying conductive ring 164.Because the UBMs 156 and conductive ring 164 are different materials,the IMCs 170 and 172 are different compounds. Further, although theconductive connectors 168 and IMCs 170 and 172 are illustrated as havingdistinguishable interfaces, it should be appreciated that the variousconductive materials may intermingle during reflow. As such, an IMC (notshown) may form at the interface 174 of the conductive connectors 168and IMCs 170 and 172 that includes conductive materials from theconductive connectors 16, conductive ring 164, and UBMs 156.

Also during reflow of the conductive connectors 168, the conductive ring164 acts as a barrier, preventing the flux 166 from flowing between theUBMs 156 and dielectric layer 158. Oxides (e.g., Cu oxide) may form atthe interface of the UBMs 156 and dielectric layer 158, acting as anadhesion layer. The flux 166 may wash away the adhesion layer, andpreventing the flux 166 from flowing into the interface may improveadhesion between the UBMs 156 and dielectric layer 158, thereby reducingthe chances of delamination at the interface. Delamination of the UBMs156 and dielectric layer 158 may result in reflowable material enteringthe interface, which may cause cracking of the dielectric layers. Byreducing delamination at the interface, the mechanical reliability ofthe front-side redistribution structure 132 may be improved.

FIG. 18 is a top-down view illustrating more details of the region 650after formation of the conductive ring 164 and before formation of theconductive connectors 168. In other words, FIG. 18 is a top-down view ofthe intermediate step shown in FIG. 17B.

In FIG. 19 , a carrier substrate de-bonding is performed to detach(de-bond) the carrier substrate 100 from the back-side redistributionstructure 110, e.g., the dielectric layer 104. The first packages 200are thereby formed in each of the first package region 600 and thesecond package region 602. In accordance with some embodiments, thede-bonding includes projecting a light such as a laser light or an UVlight on the release layer 102 so that the release layer 102 decomposesunder the heat of the light and the carrier substrate 100 can beremoved. The structure is then flipped over and placed on a tape 176.Further, openings 178 are formed through the dielectric layer 104 toexpose portions of the metallization pattern 106. The openings 178 maybe formed, for example, using laser drilling, etching, or the like.

FIGS. 20 through 21 illustrate cross-sectional views of intermediatesteps during a process for forming a package structure 500, inaccordance with some embodiments. The package structure 500 may bereferred to a package-on-package (PoP) structure.

In FIG. 20 , a second package 300 is attached to the first package 200.The second package 300 includes a substrate 302 and one or more stackeddies 308 (308A and 308B) coupled to the substrate 302. Although asingular stack of dies 308 (308A and 308B) is illustrated, in otherembodiments, a plurality of stacked dies 308 (each having one or morestacked dies) may be disposed side by side coupled to a same surface ofthe substrate 302. The substrate 302 may be made of a semiconductormaterial such as silicon, germanium, diamond, or the like. In someembodiments, compound materials such as silicon germanium, siliconcarbide, gallium arsenic, indium arsenide, indium phosphide, silicongermanium carbide, gallium arsenic phosphide, gallium indium phosphide,combinations of these, and the like, may also be used. Additionally, thesubstrate 302 may be a silicon-on-insulator (SOI) substrate. Generally,an SOI substrate includes a layer of a semiconductor material such asepitaxial silicon, germanium, silicon germanium, SOI, silicon germaniumon insulator (SGOI), or combinations thereof. The substrate 302 is, inone alternative embodiment, based on an insulating core such as afiberglass reinforced resin core. One example core material isfiberglass resin such as FR4. Alternatives for the core material includebismaleimide-triazine (BT) resin, or alternatively, other printedcircuit board (PCB) materials or films. Build up films such as Ajinomotobuild-up film (ABF) or other laminates may be used for substrate 302.

The substrate 302 may include active and passive devices (not shown). Asone of ordinary skill in the art will recognize, a wide variety ofdevices such as transistors, capacitors, resistors, combinations ofthese, and the like may be used to generate the structural andfunctional requirements of the design for the second package 300. Thedevices may be formed using any suitable methods.

The substrate 302 may also include metallization layers (not shown) andthrough vias 306. The metallization layers may be formed over the activeand passive devices and are designed to connect the various devices toform functional circuitry. The metallization layers may be formed ofalternating layers of dielectric (e.g., low-k dielectric material) andconductive material (e.g., copper) with vias interconnecting the layersof conductive material and may be formed through any suitable process(such as deposition, damascene, dual damascene, or the like). In someembodiments, the substrate 302 is substantially free of active andpassive devices.

The substrate 302 may have bond pads 303 on a first side the substrate202 to couple to the stacked dies 308, and bond pads 304 on a secondside of the substrate 302, the second side being opposite the first sideof the substrate 302, to couple to the conductive connectors 314. Insome embodiments, the bond pads 303 and 304 are formed by formingrecesses (not shown) into dielectric layers (not shown) on the first andsecond sides of the substrate 302. The recesses may be formed to allowthe bond pads 303 and 304 to be embedded into the dielectric layers. Inother embodiments, the recesses are omitted as the bond pads 303 and 304may be formed on the dielectric layer. In some embodiments, the bondpads 303 and 304 include a thin seed layer (not shown) made of copper,titanium, nickel, gold, palladium, the like, or a combination thereof.The conductive material of the bond pads 303 and 304 may be depositedover the thin seed layer. The conductive material may be formed by anelectro-chemical plating process, an electroless plating process, CVD,ALD, PVD, the like, or a combination thereof. In an embodiment, theconductive material of the bond pads 303 and 304 is copper, tungsten,aluminum, silver, gold, the like, or a combination thereof.

In an embodiment, the bond pads 303 and 304 are UBMs that include threelayers of conductive materials, such as a layer of titanium, a layer ofcopper, and a layer of nickel. However, one of ordinary skill in the artwill recognize that there are many suitable arrangements of materialsand layers, such as an arrangement of chrome/chrome-copperalloy/copper/gold, an arrangement of titanium/titanium tungsten/copper,or an arrangement of copper/nickel/gold, that are suitable for theformation of the bond pads 303 and 304. Any suitable materials or layersof material that may be used for the bond pads 303 and 304 are fullyintended to be included within the scope of the current application. Insome embodiments, the through vias 306 extend through the substrate 302and couple at least one bond pad 303 to at least one bond pad 304.

In the illustrated embodiment, the stacked dies 308 are coupled to thesubstrate 302 by wire bonds 310, although other connections may be used,such as conductive bumps. In an embodiment, the stacked dies 308 arestacked memory dies. For example, the stacked dies 308 may be memorydies such as low-power (LP) double data rate (DDR) memory modules, suchas LPDDR1, LPDDR2, LPDDR3, LPDDR4, or the like memory modules.

The stacked dies 308 and the wire bonds 310 may be encapsulated by amolding material 312. The molding material 312 may be molded on thestacked dies 308 and the wire bonds 310, for example, using compressionmolding. In some embodiments, the molding material 312 is a moldingcompound, a polymer, an epoxy, silicon oxide filler material, the like,or a combination thereof. A curing process may be performed to cure themolding material 312; the curing process may be a thermal curing, a UVcuring, the like, or a combination thereof.

In some embodiments, the stacked dies 308 and the wire bonds 310 areburied in the molding material 312, and after the curing of the moldingmaterial 312, a planarization step, such as a grinding, is performed toremove excess portions of the molding material 312 and provide asubstantially planar surface for the second package 300.

After the second package 300 is formed, the second package 300 ismechanically and electrically bonded to the first package 200 by way ofconductive connectors 314, the bond pads 304, and the metallizationpattern 106. In some embodiments, the stacked dies 308 may be coupled tothe integrated circuit dies 114 through the wire bonds 310, the bondpads 303 and 304, through vias 306, the conductive connectors 314, andthe through vias 112.

The conductive connectors 314 may be similar to the conductiveconnectors 168 described above and the description is not repeatedherein, although the conductive connectors 314 and the conductiveconnectors 168 need not be the same. The conductive connectors 314 maybe disposed on an opposing side of the substrate 302 as the stacked dies308, in the openings 178. In some embodiments, a solder resist 318 mayalso be formed on the side of the substrate 302 opposing the stackeddies 308. The conductive connectors 314 may be disposed in openings inthe solder resist 318 to be electrically and mechanically coupled toconductive features (e.g., the bond pads 304) in the substrate 302. Thesolder resist 318 may be used to protect areas of the substrate 302 fromexternal damage.

In some embodiments, before bonding the conductive connectors 314, theconductive connectors 314 are coated with a flux (not shown), such as ano-clean flux. The conductive connectors 314 may be dipped in the fluxor the flux may be jetted onto the conductive connectors 314. In anotherembodiment, the flux may be applied to the surfaces of the metallizationpattern 106.

In some embodiments, the conductive connectors 314 may have an optionalepoxy flux (not shown) formed thereon before they are reflowed with atleast some of the epoxy portion of the epoxy flux remaining after thesecond package 300 is attached to the first package 200.

An underfill (not shown) may be formed between the first package 200 andthe second package 300 and surrounding the conductive connectors 314.The underfill may reduce stress and protect the joints resulting fromthe reflowing of the conductive connectors 314. The underfill may beformed by a capillary flow process after the first package 200 isattached or may be formed by a suitable deposition method before thefirst package 200 is attached. In embodiments where the epoxy flux isformed, it may act as the underfill.

The bonding between the second package 300 and the first package 200 maybe a solder bonding. In an embodiment, the second package 300 is bondedto the first package 200 by a reflow process. During this reflowprocess, the conductive connectors 314 are in contact with the bond pads304 and the metallization pattern 106 to physically and electricallycouple the second package 300 to the first package 200. After thebonding process, an intermetallic compound (IMC, not shown) may form atthe interface of the metallization pattern 106 and the conductiveconnectors 314 and also at the interface between the conductiveconnectors 314 and the bond pads 304 (not shown).

A singulation process is performed by sawing along scribe line regions,e.g., between the first package region 600 and the second package region602. The sawing singulates the first package region 600 from the secondpackage region 602. The resulting, singulated first and second packages200 and 300 are from one of the first package region 600 or the secondpackage region 602. In some embodiments, the singulation process isperformed after the second package 300 is attached to the first package200. In other embodiments (not shown), the singulation process isperformed before the second package 300 is attached to the first package200, such as after the carrier substrate 100 is de-bonded and theopenings 178 are formed.

In FIG. 21 , the first package 200 is mounted to a package substrate 400using the conductive connectors 168. The package substrate 400 may bemade of a semiconductor material such as silicon, germanium, diamond, orthe like. Alternatively, compound materials such as silicon germanium,silicon carbide, gallium arsenic, indium arsenide, indium phosphide,silicon germanium carbide, gallium arsenic phosphide, gallium indiumphosphide, combinations of these, and the like, may also be used.Additionally, the package substrate 400 may be a SOI substrate.Generally, an SOI substrate includes a layer of a semiconductor materialsuch as epitaxial silicon, germanium, silicon germanium, SOI, SGOI, orcombinations thereof. The package substrate 400 is, in one alternativeembodiment, based on an insulating core such as a fiberglass reinforcedresin core. One example core material is fiberglass resin such as FR4.Alternatives for the core material include bismaleimide-triazine BTresin, or alternatively, other PCB materials or films. Build up filmssuch as ABF or other laminates may be used for package substrate 400.

The package substrate 400 may include active and passive devices (notshown). As one of ordinary skill in the art will recognize, a widevariety of devices such as transistors, capacitors, resistors,combinations of these, and the like may be used to generate thestructural and functional requirements of the design for the packagestructure 500. The devices may be formed using any suitable methods.

The package substrate 400 may also include metallization layers and vias(not shown) and bond pads 402 over the metallization layers and vias.The metallization layers may be formed over the active and passivedevices and are designed to connect the various devices to formfunctional circuitry. The metallization layers may be formed ofalternating layers of dielectric (e.g., low-k dielectric material) andconductive material (e.g., copper) with vias interconnecting the layersof conductive material and may be formed through any suitable process(such as deposition, damascene, dual damascene, or the like). In someembodiments, the package substrate 400 is substantially free of activeand passive devices.

In some embodiments, the conductive connectors 168 are reflowed toattach the first package 200 to the bond pads 402. The conductiveconnectors 168 electrically and/or physically couple the packagesubstrate 400, including metallization layers in the package substrate400, to the first package 200. In some embodiments, passive devices(e.g., surface mount devices (SMDs), not illustrated) may be attached tothe first package 200 (e.g., bonded to the bond pads 402) prior tomounting on the package substrate 400. In such embodiments, the passivedevices may be bonded to a same surface of the first package 200 as theconductive connectors 168.

The conductive connectors 168 may have an epoxy flux (not shown) formedthereon before they are reflowed with at least some of the epoxy portionof the epoxy flux remaining after the first package 200 is attached tothe package substrate 400. This remaining epoxy portion may act as anunderfill to reduce stress and protect the joints resulting from thereflowing the conductive connectors 168. In some embodiments, anunderfill (not shown) may be formed between the first package 200 andthe package substrate 400 and surrounding the conductive connectors 168.The underfill may be formed by a capillary flow process after the firstpackage 200 is attached or may be formed by a suitable deposition methodbefore the first package 200 is attached.

Embodiments may achieve advantages. Sealing the interface of the UBMs156 and dielectric layer 158 with the conductive ring 164 may helpprevent delamination of the interface, increasing the mechanicalreliability of the front-side redistribution structure 132. Forming theconductive ring 164 to a width W₁ of from about 30 μm to about 50 μm mayallow sufficient contact area between the UBMs 156 and conductiveconnectors 168 while allowing for use of a printing formation process.

In an embodiment, a device includes: an integrated circuit die; a firstdielectric layer over the integrated circuit die; a first metallizationpattern extending through the first dielectric layer to electricallyconnect to the integrated circuit die; a second dielectric layer overthe first metallization pattern; an under bump metallurgy extendingthrough the second dielectric layer; a third dielectric layer over thesecond dielectric layer and portions of the under bump metallurgy; aconductive ring sealing an interface of the third dielectric layer andthe under bump metallurgy; and a conductive connector extending throughthe center of the conductive ring, the conductive connector electricallyconnected to the under bump metallurgy.

In an embodiment, the device further includes: flux on the under bumpmetallurgy, the flux adjoining an inner sidewall of the conductive ring,the conductive connector being on the flux. In an embodiment of thedevice, the conductive ring separates the conductive connector from thefirst dielectric layer. In an embodiment of the device, the under bumpmetallurgy extends through an opening in the second dielectric layer,the under bump metallurgy having a first radius, the opening having asecond radius less than the first radius. In an embodiment of thedevice, the conductive ring is around the opening, the conductive ringhaving an annular shape with an outer radius and an inner radius, adifference between the outer radius and the inner radius being from 30μm to 50 μm. In an embodiment of the device, the first radius of theunder bump metallurgy is greater than the outer radius of the conductivering. In an embodiment of the device, the second radius of the openingis greater than the inner radius of the conductive ring and less thanthe outer radius of the conductive ring. In an embodiment of the device,the first radius of the under bump metallurgy is greater than the secondradius of the opening. In an embodiment of the device, the conductivering extends along top surfaces of the third dielectric layer and theunder bump metallurgy. In an embodiment of the device, the conductivering and the under bump metallurgy include different conductivematerials.

In an embodiment, a device includes: an integrated circuit die; athrough via adjacent the integrated circuit die; an encapsulant aroundthe through via and the integrated circuit die; and a redistributionstructure including: a first metallization pattern on a first dielectriclayer, the first dielectric layer disposed on the encapsulant, the firstmetallization pattern extending through the first dielectric layer toelectrically connect to the through via; an under bump metallurgy on asecond dielectric layer, the second dielectric layer disposed on thefirst dielectric layer, the under bump metallurgy extending through thesecond dielectric layer to electrically connect to the firstmetallization pattern; and a conductive ring on a third dielectriclayer, the third dielectric layer disposed on the second dielectriclayer, the conductive ring sealing an interface of the third dielectriclayer and the under bump metallurgy.

In an embodiment, the device further includes: conductive connectors onthe under bump metallurgy and the conductive ring, the conductive ringseparating the conductive connectors from the third dielectric layer. Inan embodiment, the device further includes: a substrate electrically andphysically connected to the redistribution structure by the conductiveconnectors. In an embodiment of the device, the conductive ring extendsthrough the third dielectric layer, from top surface of the thirddielectric layer to a top surface of the under bump metallurgy.

In an embodiment, a method includes: depositing a first dielectric layerdisposed over an integrated circuit die; forming a first metallizationpattern extending along the first dielectric layer; depositing a seconddielectric layer over the first metallization pattern and the firstdielectric layer; forming an under bump metallurgy extending along thesecond dielectric layer; depositing a third dielectric layer over theunder bump metallurgy and the second dielectric layer; forming anopening in the third dielectric layer exposing the under bumpmetallurgy; dispensing a conductive paste at an interface of the thirddielectric layer and the under bump metallurgy; and curing theconductive paste to form a conductive ring sealing the interface of thethird dielectric layer and the under bump metallurgy.

In an embodiment of the method, the conductive paste is solder paste. Inan embodiment of the method, the curing the conductive paste includes:annealing the solder paste at a temperature of from about 100° C. toabout 200° C. for a time period of from 30 minutes to 2 hours. In anembodiment, the method further includes: coating exposed portions of theunder bump metallurgy with flux, the conductive ring separating the fluxfrom sides of the third dielectric layer defining the opening; andplacing a conductive connector on the flux and the conductive ring. Inan embodiment, the method further includes: reflowing the conductiveconnector to form a first intermetallic compound (IMC) and a second IMC,the first IMC formed at an interface of the conductive connector and theunder bump metallurgy, the second IMC formed at an interface of theconductive ring and the under bump metallurgy. In an embodiment of themethod, the dispensing the conductive paste at the interface includes:printing the conductive paste on the under bump metallurgy, on sides ofthe third dielectric layer defining the opening, and on top portions ofthe third dielectric layer proximate the sides.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A device comprising: an integrated circuit die; afirst dielectric layer over the integrated circuit die; an under bumpmetallurgy extending through the first dielectric layer, the under bumpmetallurgy connected to the integrated circuit die; a second dielectriclayer over the under bump metallurgy and the first dielectric layer; aconductive ring sealing an interface of the second dielectric layer andthe under bump metallurgy, the conductive ring comprising a firstconductive material; a conductive connector extending through theconductive ring, the conductive connector connected to the under bumpmetallurgy, the first conductive material of the conductive ringextending between the conductive connector and the second dielectriclayer; a first intermetallic compound at an interface of the conductiveconnector and the under bump metallurgy; and a second intermetalliccompound at an interface of the conductive connector and the conductivering, the first intermetallic compound and the second intermetalliccompound being different compounds.
 2. The device of claim 1, whereinthe first conductive material is a conductive paste.
 3. The device ofclaim 1, wherein the conductive ring and the under bump metallurgycomprise different conductive materials.
 4. The device of claim 1further comprising: a third intermetallic compound at an interface ofthe first intermetallic compound and the second intermetallic compound.5. The device of claim 1, wherein the conductive ring has an outerradius and an inner radius, and a difference between the outer radiusand the inner radius is from about 30 μm to about 50 μm.
 6. The deviceof claim 1, wherein the conductive ring has an outer radius and an innerradius, the under bump metallurgy has a first radius, and the firstradius is greater than the outer radius.
 7. The device of claim 1,wherein the conductive ring has an outer radius and an inner radius, theconductive connector has a first radius, and the first radius is greaterthan the inner radius.
 8. The device of claim 1, wherein the under bumpmetallurgy has a first radius, the conductive connector has a secondradius, and the first radius is greater than the second radius.
 9. Thedevice of claim 1 further comprising: an encapsulant around theintegrated circuit die, the first dielectric layer disposed over theencapsulant.
 10. A device comprising: an integrated circuit die; anencapsulant around the integrated circuit die; and a redistributionstructure on the encapsulant, the redistribution structure comprising: ametallization pattern connected to the integrated circuit die; a firstdielectric layer on the metallization pattern; an under bump metallurgyextending through the first dielectric layer, the under bump metallurgyconnected to the metallization pattern; a second dielectric layer on theunder bump metallurgy and the first dielectric layer; and a conductivering sealing an interface of the second dielectric layer and the underbump metallurgy, the conductive ring comprising a conductive paste, theconductive paste of the conductive ring contacting the second dielectriclayer and the under bump metallurgy, wherein the conductive ring has anouter radius and an inner radius, and a difference between the outerradius and the inner radius is from about 30 μm to about 50 μm.
 11. Thedevice of claim 10, wherein the conductive paste is a copper paste, asolder paste, or a silver paste.
 12. The device of claim 10 furthercomprising: a package substrate; and a conductive connector connected tothe package substrate and the under bump metallurgy, the conductiveconnector extending through the conductive ring, the conductive paste ofthe conductive ring contacting the conductive connector.
 13. The deviceof claim 12 further comprising: a first intermetallic compound at aninterface of the conductive connector and the under bump metallurgy; asecond intermetallic compound at an interface of the conductiveconnector and the conductive ring; and a third intermetallic compound atan interface of the first intermetallic compound and the secondintermetallic compound.
 14. The device of claim 10 further comprising: athrough via extending through the encapsulant, the metallization patternconnected to the through via.
 15. The device of claim 14 furthercomprising: a memory device; and a conductive connector connected to thememory device and the through via.
 16. The device of claim 10 furthercomprising: an oxide disposed at the interface of the under bumpmetallurgy and the second dielectric layer.
 17. A device comprising: anintegrated circuit die; a first dielectric layer over the integratedcircuit die; an under bump metallurgy extending through the firstdielectric layer, the under bump metallurgy being electrically connectedto the integrated circuit die; a second dielectric layer over the underbump metallurgy and the first dielectric layer; a conductive annulusextending through the second dielectric layer, the conductive annuluscomprising a first reflowable material, the first reflowable materialcontacting the second dielectric layer and the under bump metallurgy;and a reflowable connector extending through the center of theconductive annulus, the second dielectric layer, and partially throughthe first dielectric layer, wherein a bottommost surface of thereflowable connector is below a bottommost surface of the conductiveannulus.
 18. The device of claim 17, wherein the conductive annulus hasan inner radius and an outer radius, the under bump metallurgy has afirst radius, the first radius being greater than the outer radius. 19.The device of claim 17, wherein the reflowable connector comprises asecond reflowable material, the second reflowable material contactingthe under bump metallurgy, wherein the first reflowable material and thesecond reflowable material are different reflowable materials.
 20. Thedevice of claim 17, wherein the reflowable connector comprises a secondreflowable material, the second reflowable material contacting the underbump metallurgy, wherein the first reflowable material and the secondreflowable material are the same reflowable material.